The newly developed EBS Laser Attenuator allows computer controlled attenuation of a monochromatic light source from 1-99% within the wavelength region ~550-1000nm.
The Laser Attenuator incorporates technology derived from a joint collaboration between EBS (originator) and Delta Optical Thin Films A/S of Denmark (DOTF), creating the EBS/DOTF novel Laser Optical Multilayer Attenuator (LOMA).
The LOMA uses a wedge design to allow control of the intensity or power of the laser beam. Providing control of attenuation from 1% to 99% (see Figure 1).
The EBS Laser Attenuator combines the EBS/DOTF LOMA with a linear drive, control electronics and dedicated software to allow computer control of the percentage of attenuation in use.